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Double exposure device - List of Manufacturers, Suppliers, Companies and Products

Double exposure device Product List

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Automatic Equal Magnification Exposure Device (Auto Mask Aligner) Maskaligner

Automatic Equal Magnification Exposure Device (Auto Mask Aligner) Maskaligner

Easy setup, automatic parallel adjustment, complete non-contact gap management. Auto mask aligner with auto-alignment feature. Custom-made options available!

The product is an auto batch equal magnification exposure mask alignment device. It performs automatic parallel adjustment of the photomask and wafer in a completely non-contact manner. Equipped with a super-precise UVW drive stage and high-performance image processing, it accurately aligns the photomask and wafer. It supports both soft and hard contact. With a lineup tailored to production volume, ranging from manual machines to fully automatic machines, we achieve low prices by handling everything from design to manufacturing and sales in-house. 【Features】 ■ Complete non-contact parallel alignment and exposure of photomask and wafer ■ Auto alignment function ■ Easy setup changes, compatible with multiple substrate sizes ■ Space-saving and easy maintenance ■ Achieves low cost and compact design, suitable for small-batch production of various types ■ Equipped with a super-precise UVW stage *For more details, please refer to the PDF document or feel free to contact us.

  • Other semiconductor manufacturing equipment
  • Photomask

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2-size inch compatible automatic equal exposure device (auto mask aligner)

2-size inch compatible automatic equal exposure device (auto mask aligner)

A wafer 2-size compatible auto mask aligner that allows for easy size switching. Simple setup, automatic parallel adjustment, complete non-contact gap management, and auto alignment.

The product is an automatic batch equal exposure mask alignment device. It can accommodate two sizes of wafers: φ3, 4 inches and φ4, 6 inches. Switching between sizes is very simple; just replace three components. No fine adjustments of the transport robot are necessary. Furthermore, it performs fully non-contact automatic parallel adjustment of the photomask and wafer, significantly reducing setup time in the manufacturing process. Equipped with a super-precise UVW drive stage and high-performance image processing, it accurately aligns the photomask and wafer. It supports both soft and hard contact. With a lineup tailored to production volume, ranging from manual machines to fully automatic machines, we achieve low prices by handling everything from design to manufacturing and sales in-house. 【Features】 ■ Supports multiple substrate sizes ■ Easy setup change ■ Fully non-contact parallel alignment and exposure of photomask and wafer ■ Auto-alignment function ■ Space-saving and easy maintenance ■ Achieves low price and compact design, suitable for small-batch production of various types ■ Equipped with a super-precise UVW stage *For more details, please refer to the PDF document or feel free to contact us.

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Manual equal exposure device (manual mask aligner)

Manual equal exposure device (manual mask aligner)

Easy setup, automatic parallel adjustment, complete non-contact gap management. A low-cost manual mask aligner without a transport system.

This product is a manual batch equal exposure mask alignment device. It is a device that sets the substrate on the exposure stage and performs exposure. The wafer is manually set onto the exposure stage. The tedious alignment of the photomask and wafer, as well as gap adjustments, are done automatically. Additionally, by incorporating a super-precision UVW drive stage and performing high-performance image processing, the alignment of the photomask and wafer is carried out accurately. It supports both soft and hard contact. With a lineup tailored to production volume, ranging from manual to fully automatic machines, we achieve low prices by handling everything from design to manufacturing and sales in-house. Custom orders for special substrates are also accepted. 【Features】 - Complete non-contact alignment and exposure of photomask and wafer - Equipped with auto-alignment function - Easy setup changes, compatible with multiple substrate sizes - Suitable for small-batch production, research, and development - Space-saving and easy maintenance - Achieves low price and compact design - Equipped with super-precision UVW stage - Custom orders for special substrates available *For more details, please refer to the PDF document or feel free to contact us.

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Semi-automatic equal exposure device (Semi-Auto Mask Aligner)

Semi-automatic equal exposure device (Semi-Auto Mask Aligner)

Easy setup, automatic parallel adjustment, complete non-contact gap management. Semi-automatic mask aligner equipped with a transport unit.

This product is a semi-automatic batch equal exposure mask alignment device. It sets one substrate at a time and automatically performs transportation and exposure after the substrate is set. It conducts fully non-contact automatic parallel adjustment between the photomask and the wafer. The cumbersome task of manually adjusting the gap is completely unnecessary. Additionally, by equipping a super-precise UVW drive stage and performing high-performance image processing, it accurately aligns the photomask and the wafer. It supports both soft and hard contact. With a lineup tailored to production volume, ranging from manual machines to fully automatic machines, we achieve low prices by handling everything from design to manufacturing and sales in-house. Custom orders for special substrates are also accepted. 【Features】 ■ Fully non-contact parallel alignment and exposure of photomask and wafer ■ Equipped with auto-alignment function ■ Easy setup change, compatible with multiple substrate sizes ■ Suitable for small-batch production, research, and development ■ Space-saving and easy maintenance ■ Achieves low price and compact design ■ Equipped with super-precise UVW stage ■ Custom orders for special substrates available *For more details, please refer to the PDF document or feel free to contact us.

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